Virtuoso DFM preserves design intent (such as electrical constraints), ensures fast convergence on design goals through accurate abstraction, and provides highly convergent results through near-linear scalability and automatic fixing of errors. This enables engineers to implement a “correct-by-design” flow, so they can efficiently and predictably reach tapeout on leading-edge designs with multiple foundry partners. Virtuoso DFM allows designers to identify, analyze, and automatically optimize the design’s on-chip parameters for the impact of physical effects such as lithography, mask, OPC, etch, and RET; as well as layout-dependent effects such as litho, overlay, context-dependent stress, strain, well proximity, unintentional stressors like shallow-trench isolation, contact-to-contact spacing, and more. In addition, the Virtuoso in-design methodology provides an accurate, model-based flow for designers to minimize the impact of manufacturing variations on design performance.

Features/Benefits

• In-design DFM and predictable DFM closure for custom design implementation
• Production-proven “golden” pattern matcher for in-design DRC+ for GLOBALFOUNDRIES 28nm process
• Foundry-golden, comprehensive, model-based litho hotspot analysis
• Industry’s first in-design, constraint-driven layout-dependent-effects variability detection and optimization
• Higher productivity and more predictable tapeout schedules